手机十三水作弊软件|十三水棋牌游戏赚钱
首页 > 论文 > 激光技术 > 43卷 > 4期(pp:585-590)

PET复合衬底上梯度介质薄膜厚度的椭偏表征

Ellipsometric characterization of the thickness of gradient dielectric films on PET composite substrates

  • 摘要
  • 论文信息
  • 参考文献
  • 被引情况
  • PDF全文
分享:

摘要

为了监控3维玻璃上聚对苯二甲酸乙二醇酯(PET)复合衬底介质膜膜厚, 采用将PET复合衬底等效为单层基底材料的建模分析方法, 通过椭偏测量技术实现了复杂衬底上TiO2梯度折射率材料薄膜厚度的检测。结果表明, 采用该方法测量的PET复合衬底上TiO2梯度折射率薄膜厚度为212.48nm, 扫描电子显微镜的测量结果为211nm, 结果非常准确。以TiO2为例验证了等效衬底方法, 该方法也同样适用于其它介质膜。等效衬底法可实现PET复合衬底上的TiO2薄膜厚度的高精度测量表征, 对镀膜工?#23637;?#31243;监控具有重要意义。

Abstract

In order to monitor the film thickness of polyethylene terephthalate (PET) composite substrate on 3-D glass, modeling analysis method of PET composite substrates equivalent to single-layer substrates was adopted. The thickness measurement of titanium dioxide gradient refractive index material thin films on complex substrates was realized by ellipsometry. The result show that, the thickness of titanium dioxide gradient refractive index films on PET composite substrates is 212.48nm by this method. The results of scanning electron microscopy is 211nm. The result is very accurate. The equivalent substrate method is validated by taking titanium dioxide as an example. The method is also applicable to other dielectric films. This method can measure and characterize the thickness of titanium dioxide thin films on PET composite substrates with high accuracy, and is of great significance for monitoring the coating process.

Newport宣传-MKS新实验室计划
补充资料

中图分类号:TN249

DOI:10.7510/jgjs.issn.1001-3806.2019.04.026

所属栏目:激光与光电子技术应用

基金项目:国家重点研发计划资助项目(2017YFF0204705)

收稿日期:2018-12-04

修改稿日期:2019-04-08

网络出版日期:--

作者单位    点击查看

郭春付?#20309;?#27721;颐光科技有限公司, 武汉 430223
张传维?#20309;?#27721;颐光科技有限公司, 武汉 430223华中科技大学 数字制造装备与技术国家重点实验室, 武汉430074
李伟奇?#20309;?#27721;颐光科技有限公司, 武汉 430223
李晓平:华中科技大学 武汉光电国家研究中心, 武汉 430074
刘世元?#20309;?#27721;颐光科技有限公司, 武汉 430223华中科技大学 数字制造装备与技术国家重点实验室, 武汉430074华中科技大学 武汉光电国家研究中心, 武汉 430074

联系人作者:李晓平([email protected])

备注:郭春付(1986-), 男, 硕士, 现主要从事高端椭偏仪开发及其关键材料表征应用的研究工作。

【1】JELLISON G E, HUNN J D, LOWDEN R A. Optical characterization of tristructural isotropic fuel particle cross-sections using generalized ellipsometry[J]. Journal of Nuclear Materials, 2006, 352(1): 6-12.

【2】JELLISON G E. Generalized ellipsometry for materials characterization[J]. Thin Solid Films, 2004, 450(1): 42-50.

【3】LOUIS B, KRINS N, FAUSTINI M, et al. Understanding crystallization of anatase into binary SiO2/TiO2 sol-gel optical thin films: An in situ thermal ellipsometry analysis[J]. Journal of Physical Chemistry, 2011, C18(1): 15-37.

【4】CAMACHOLOPEZ M A, SANCHEZPEREZ C A, ESPARZAGARCIA A, et al. Optical properties of TiO2-x thin films studied by spectroscopic ellipsometry: substrate temperature effect[J]. Proceedings of the SPIE, 2004, 5622: 545-550.

【5】BABONAS G J, NIILISK A, REZA A, et al. Spectroscopic ellipso-metry of TiO2/Si[J]. Proceedings of the SPIE, 2003, 5122: 50-55.

【6】VERG H L M, MALKOMES N, STAEDLER T, et al. Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control[J]. Thin Solid Films, 1999, 351(1): 42-47.

【7】YU G, WATANABE J, KRISHNA K M, et al. Determination of optical constants of solgel-derived inhomogeneous TiO2 thin films by spectroscopic ellipsometry and transmission spectroscopy[J]. Applied Optics, 1998, 37(4): 691-697.

【8】ZHAO B X. The TiO2 light trapping films for solar cells [D]. Changsha: Central South University, 2012: 1-100 (in Chinese).

【9】CALLARD S, GAGNAIRE A, JOSEPH J. Characterization of graded refractive index silicon oxynitride thin films by spectroscopic ellipso-metry[J]. Thin Solid Films, 1998, 313/314(1/2): 384-388.

【10】FUJIWARA H, KOH J, COLLINS R W. Depth-profiles in compositionally-graded amorphous silicon alloy thin films analyzed by real time spectroscopic ellipsometry[J]. Thin Solid Films, 1998, 313/314(1/2): 474-478.

【11】JELLISON G E. The calculation of thin film parameters from spectroscopic ellipsometry data[J]. Thin Solid Films, 1996, 290/291: 40-45.

【12】FUJIWARA H. Spectroscopic ellipsometry: principles and applications[M]. Hoboken, New Jersey, USA: John Wiley & Sons, 2007: 1-369.

【13】TOMPKINS H G, IRENE E A. Handbook of ellipsometry[M]. Berlin,Germany: Springer, 2005: 481-566.

【14】LI W, JIANG H, ZHANG C, et al. Characterization of curved surface layer by Mueller matrix ellipsometry[J]. Journal of Vacuum Science & Technology, 2016, B34(2): 020602.

【15】LI W, ZHANG C, JIANG H, et al. Depolarization artifacts in dual rotating-compensator Mueller matrix ellipsometry[J]. Journal of Optics, 2016,18(5): 55701.

【16】CHEN X, JIANG H, ZHANG C, et al. Towards understanding the detection of profile asymmetry from Mueller matrix differential decomposition[J]. Journal of Applied Physics, 2015,118(22): 225308.

【17】LIU S, CHEN X, ZHANG C. Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology[J]. Thin Solid Films, 2015, 584: 176-185.

【18】CHEN X G, LIU Sh Y, ZHANG Ch W, et al. Accurate characte-rization of nanoimprinted resist patterns using Mueller matrix ellipsometry[J]. Optics Express, 2014, 22(12): 15165-15177.

【19】LI W Q. Research on development and application of a high-precision broadband mueller matrix ellipsometer[D]. Wuhan: Huazhong University of Science and Technology, 2016: 7-9(in Chinese).

【20】CHEN X G, LIU Sh Y, ZHANG Ch W, et al. Accurate measurement of templates and imprinted grating structures using Mueller matrix ellipsometry[J]. Acta Physica Sinica, 2014, 63(18): 180701(in Chinese).

引用该论文

GUO Chunfu,ZHANG Chuanwei,LI Weiqi,LI Xiaoping,LIU Shiyuan. Ellipsometric characterization of the thickness of gradient dielectric films on PET composite substrates[J]. Laser Technology, 2019, 43(4): 585-590

郭春付,张传维,李伟奇,李晓平,刘世元. PET复合衬底上梯度介质薄膜厚度的椭偏表征[J]. 激光技术, 2019, 43(4): 585-590

您的浏览器不支持PDF插件,请使用最新的(Chrome/Fire Fox等)浏览器.或者您还可以点击此处下载该论文PDF

手机十三水作弊软件 在线21点安卓版 不看牌抢庄牛牛口诀 重庆欢乐生肖开奖号码 彩经网时时彩万能6码 北京pk10计划手机软件 飞艇计划人工在线全天免费版 阿止博客娱乐 三公棋牌位置 嘉禾在线娱乐 明牌牛牛抢庄高手